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Ion Source Product List and Ranking from 5 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

Ion Source Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. アールエムテック Tokyo//Optical Instruments
  2. フォンアルデンヌジャパン Tokyo//Other manufacturing
  3. エーエムアール 本社・ラボセンター Tokyo//others
  4. 4 昭和真空 Kanagawa//Industrial Machinery
  5. 5 テクノアルファ Tokyo//Electronic Components and Semiconductors
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Ion Source Product ranking

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. Linear Ion Source "LION" フォンアルデンヌジャパン
  2. Grid Ion Source Specification Details アールエムテック
  3. Kaufman Grid Type Ion Source アールエムテック
  4. Kaufman Gridless (End-Hole Type) Ion Source アールエムテック
  5. 4 Direct Atmospheric Pressure Ionization Source "DART" エーエムアール 本社・ラボセンター

Ion Source Product List

1～8 item / All 8 items

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Imaging mass spectrometry ion source for mass analysis devices

Imaging mass spectrometry ion source for mass analysis devices

"ESI and MALDI can be used without modification" - a groundbreaking ion source that enables imaging mass spectrometry in addition to conventional analysis.

The Spectroglyph MALDI/ESI injector is a groundbreaking ion source that enables imaging mass spectrometry in addition to conventional analysis when attached to a Thermo Fisher Scientific mass spectrometer. 【Features】 ◆ ESI and MALDI can be used without replacement The ESI ion source is connected orthogonally to the MALDI source, allowing for a change between ESI and MALDI simply by modifying the parameters within the device. ◆ Unique internal structure 1. Translation stage 2. Slide glass mount 3. High pressure ion funnel 4. Inlet capillary housing 5. Slide valve 6. Ion funnel trap 7. Beam expander 8. CCD camera The injector is equipped with a dual ion funnel, which prevents neutral substances from being introduced into the mass spectrometer, resulting in an improved S/N ratio for the samples. Additionally, by reducing the pressure within the chamber (to 6-7 torr), the ionization efficiency of the samples is also increased.

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  • Other physicochemical equipment

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Grid Ion Source Specification Details

Grid Ion Source Specification Details

We are publishing the specifications of various grid ion sources manufactured by Kaufman & Robinson.

At OSI Industry, we handle various grid ion sources manufactured by Kaufman & Robinson. We have detailed specifications for each type of grid ion source, so please take this opportunity to have a look. 【Contents Listed】 ● Discharge / Discharge Current / Discharge Power ● Grid ● Beam Type ● Gas Flow Rate ● Gas ● Pressure ● Ion Gun Height / Ion Gun Diameter ● Neutralizer For more details, please download the catalog or contact us.

  • Other semiconductor manufacturing equipment

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High-Power RF Ion Source "ISG-180"

High-Power RF Ion Source "ISG-180"

It is a high-output RF ion source that achieves a wide range and stable discharge.

It enables stable discharge over a wide range and can be used for various applications, from improving adhesion from non-shift films of optical filters to resin substrates. Our unique approach allows for reliable ignition and stable discharge performance. 【Features】 ○ High-output ion source with beam current of 1500mA / beam voltage of 1500V / ion current density of over 100μA/cm² ○ Achieves uniformity of ion current density distribution within ±10% (measured with the 1300 and 1550 devices) at high power → Measurement results from Sapio-1300, limited to specified conditions by Showa Vacuum Co., Ltd. ○ Adoption of an auto-matcher for the neutralizer to ensure reliable ignition performance and stabilization ○ The use of a newly developed collector electrode (patent pending) enables high output with an emission current of 2500mA → Prevents particle generation due to charge-up For more details, please contact us or download the catalog.

  • Ion implantation equipment

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Kaufman Gridless (End-Hole Type) Ion Source

Kaufman Gridless (End-Hole Type) Ion Source

Cafmangridless ion source set

For more details, please contact us or download the catalog. *This catalog is in English.

  • Evaporation Equipment
  • Etching Equipment
  • Plasma surface treatment equipment

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Kaufman Grid Type Ion Source

Kaufman Grid Type Ion Source

The KRI grid ion source is available in DC type and RF type.

Kaufman-type gridded ion gun RFICP ion source grid sizes: 4cm, 10cm, 14cm, 22cm, 36cm DC ion source grid sizes: 1cm, 4cm, 8cm, 10cm, 16cm The versatile gridded series of broad beam ion sources are available in different sizes which cover both R&D and high yield production requirements. Large ion beam sources meet critical output performance for uniform coverage over wide process zones. For more details, please contact us or download the catalog. *This catalog is in English.

  • Evaporation Equipment
  • Other semiconductor manufacturing equipment
  • Etching Equipment

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Direct Atmospheric Pressure Ionization Source "DART"

Direct Atmospheric Pressure Ionization Source "DART"

Introducing a direct atmospheric pressure ion source that allows for instant mass analysis just by holding it up without any preprocessing!

"DART" is an atmospheric pressure direct ion source that allows mass spectrometry without any sample preparation. Simply hold it up to the sample, regardless of its state—solid, liquid, or gas. Continuous measurement enables monitoring of changes in real time. Furthermore, since measurements can be taken without sample preparation, there is no need for dissolution. 【Features】 ■ Just hold it up to the sample, regardless of its state—solid, liquid, or gas ■ Real-time analysis allows for measurement before any alteration occurs ■ No need for dissolution as measurements can be taken without sample preparation ■ APCI-based soft ionization is less affected by salts ■ Protonated and deprotonated molecules are easily generated ■ Continuous measurement allows for monitoring of changes in real time *For more details, please refer to the PDF document or feel free to contact us.

  • Secondary ion mass spectrometer
  • Mass Spectrometer
  • Analytical Equipment

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Atmospheric Pressure Ion Source "SICRIT"

Atmospheric Pressure Ion Source "SICRIT"

High-sensitivity analysis ion source for volatile components, easily connects to LCMS, direct ion source with ppt sensitivity.

The "SICRIT" developed by Plasmion is an ion source unit equipped with a flow-through soft ionization technology, which is the first of its kind for atmospheric pressure mass spectrometry. It is directly attached to the sample introduction section of the MS and ionizes molecules drawn into the introduction section using a uniquely shaped cold plasma. Since the plasma is generated just before the introduction section, the transmission rate and thus the sensitivity are significantly improved. It can be connected to LC and GC systems. 【Features】 ■ Robust and high sensitivity. A versatile ion source ■ Enables high-sensitivity analysis in the ppt order ■ Easily attachable to LC-MS systems from various manufacturers and ready for immediate use ■ Usable with LC and GC. Also capable of ppq order analysis with direct SPME-MS ■ No sample pretreatment or ionization adjustment required *For more details, please refer to the PDF document or feel free to contact us.

  • Air Analysis Equipment

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Linear Ion Source "LION"

Linear Ion Source "LION"

Robust and scalable design! High-energy, strongly focused beam.

"LION" is a component suitable for pre-treatment and surface modification. It removes hydrocarbons through argon processing and can add oxygen if necessary. The ion beam is strongly focused and has high energy. It is an ideal device for inline film deposition systems that require physical etching, and due to its simple and robust design, the ion source can be easily scaled up. The main applications are large-area glass film deposition and metal foil deposition. 【Features】 ■ Removes hydrocarbons through argon processing and can add oxygen if necessary ■ Available in an external version with adjustable angle and a flange-mounted version ■ Robust and scalable design ■ High-energy, strongly focused beam ■ Pre-treatment of various types of substrate materials *For more details, please refer to the PDF materials or feel free to contact us.

  • Electron beam lithography equipment

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